| Model |
OIS-Two |
OIS-Two Plus |
| Dimensions |
φ300mm×150mm(H) |
| Grids |
φ17cm three molybdenum grids |
| Beam Voltage |
100V～1500V |
| Max Beam Current |
1200mA(max） |
| Acc Voltage |
100V～1000V |
| Max RF Power |
750W |
1000W |
| Gas Flow Rate |
20sccm～30sccm(argon)
40sccm～60sccm(oxygen) |
| Pressure |
5×10-2Pa |
| Water-cooling |
RF coil and beam unit |
| Neutralizer |
| Dimensions |
φ7cm×12cm |
φ7cm×12cm |
| Max Emission Current |
2000mA |
2400mA |
| Max RF Power |
150W |
| Gas Flow Rate |
5sccm～10sccm(argon only) | Specifications may be subject to change without notice.
|
Application
Optorun OIS-Two RF ion sources are developed for high-rate and
wide-area ion-assisted deposition and substrate ion cleaning, which
are installed in Optorun OTFC-1300 and OTFC-1550 coaters for
mass production of various optical filters.
FEATURES
■ Original grid designed for longer life.
■ Filamentless design. Less contamination and long life.
■ High and uniform current beams with broad beam angle.
■ Stable operation for long time. |
|
