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| Electron Source |
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Application
Its high current density is remarkably effective at increasing plasma
density and preventing the plasma process from charge-up. Long
time stability and less contamination in the oxygen process achieved
by RF excitation. Two sources can be controlled simultaneously.
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| Specifications of Electron Source |
| Neutralizer |
RFN-3A |
| Emission |
3000mA |
| Max RF Power |
150W(max） |
| Controller |
OIS-ESC |
| Neutralizer DC |
OISN-Ⅱ |
| Neutralizer RF |
AX300Ⅲ（300W） | |
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